Skip to main content Skip to search Skip to main navigation

Clinisept+ Skin 490 ml

Product information "Clinisept+ Skin 490 ml"

Clinisept+ Skin 490 ml – Advanced Skin Cleansing for Professional Aesthetic Treatments

Clinisept+ Skin is a professional‑grade skin cleansing solution designed for use before, during, and after aesthetic procedures. Its advanced hypochlorous technology ensures optimal skin hygiene while remaining gentle, non‑irritating, and suitable even for sensitive skin. The formulation provides highly effective microbial control without the drawbacks of traditional antiseptics.

Properties

  • Supports effective skin cleansing and hygiene
  • Skin‑neutral pH, non‑irritating, and dermatologically tested
  • Free from chlorhexidine, alcohol, mineral oils, and fragrances
  • Gentle on the skin and suitable for sensitive skin types
  • Leaves no residue and provides a fresh, clean skin feel
  • Ideal for aesthetic procedures such as injections, microneedling, microblading, laser treatments, and chemical peels

Application

Clinisept+ Skin is a ready‑to‑use aqueous solution.
It can be transferred into a sterile container and applied to the skin using a sterile gauze pad or swab to fully moisten the treatment area, or applied directly using the spray attachment.
During procedures, Clinisept+ Skin may be used for continuous skin cleansing.
After treatment, a Clinisept‑soaked compress may be left on the skin to provide a cooling and soothing effect.

Clinisept+ Skin is available with both a spray nozzle and a pump dispenser.

Indications

  • Professional skin cleansing before, during, and after aesthetic treatments
  • Supporting reduced irritation and improved skin comfort
  • Enhancing hygiene standards in clinical and cosmetic environments

Packaging Content

  • 1 bottle × 490 ml (with spray or pump attachment, depending on variant)

Additional Information

Use only in accordance with local regulations and exclusively by medically qualified professionals.
Product image may vary from actual packaging.